METHOD OF MANUFACTURING LIGHT PERMEABLE ELECTROMAGNETIC WAVE SHIELD MATERIAL, AND LIGHT PERMEABLE ELECTROMAGNETIC WAVE SHIELD MATERIAL

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a light permeable electromagnetic wave shield material, in which an electromagnetic wave shield layer having a uniform thickness and line width is formed. SOLUTION: The method of manufacturing the light permeable electromagnetic wave shield material includes the processes of: forming a patterned resin layer 130 by patterning and printing a composition containing a synthetic resin having no anionic group on a surface processing layer 120 of a transparent base material 110 in which the surface processing layer 120 containing a compound having an anionic group is formed; forming a patterned plating catalyst layer 140 on the resin layer 130 by bringing a plating catalyst compound solution into contact with the resin layer 130; and forming a patterned metal conductive layer 150 on the plating catalyst layer 140 by performing nonelectrolytic plating and/or electrolytic plating. COPYRIGHT: (C)2011,JPO&INPIT