| 摘要 |
PROBLEM TO BE SOLVED: To provide a stage capable of preventing the generation of the unevenness of application. SOLUTION: The stage 80 is adapted for floating and supporting a substrate to be treated to which a treatment liquid is applied to convey the substrate to be treated in one direction in which the stage has a plurality of gas jet apertures 88 that jet gases upwardly, the gas jet apertures formed slit-like in a width direction of the substrate and provided in parallel along the convey direction of the substrate. In the slit-like gas jet apertures 88, there are provided partition members 93 that multiply partition a longitudinal direction of each gas jet aperture. COPYRIGHT: (C)2011,JPO&INPIT |
