发明名称 APPARATUS AND METHOD OF APPLICATION AND DEVELOPMENT
摘要 A block for coating film formation and a block for a development process are stacked. A delivery stage to effect delivery of a substrate with a transportation unit for use in a block is provided for each process block at the carrier block side to constitute a shelf-type delivery stage group. A vertical transportation unit is provided to transport a substrate between the delivery stages in the delivery stage group. A substrate inspection unit is disposed at an upper empty space of the carrier block. A substrate is input to the substrate inspection unit directly by the vertical transportation unit or via a delivery stage in the delivery stage group. The substrate inspection unit may be disposed in the delivery stage group.
申请公布号 US2011032494(A1) 申请公布日期 2011.02.10
申请号 US20100909191 申请日期 2010.10.21
申请人 TOKYO ELECTRON LIMITED 发明人 MATSUOKA NOBUAKI;HAYASHI SHINICHI;HAYASHIDA YASUSHI;HARA YOSHITAKA
分类号 G03B27/32 主分类号 G03B27/32
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