发明名称 |
APPARATUS AND METHOD OF APPLICATION AND DEVELOPMENT |
摘要 |
A block for coating film formation and a block for a development process are stacked. A delivery stage to effect delivery of a substrate with a transportation unit for use in a block is provided for each process block at the carrier block side to constitute a shelf-type delivery stage group. A vertical transportation unit is provided to transport a substrate between the delivery stages in the delivery stage group. A substrate inspection unit is disposed at an upper empty space of the carrier block. A substrate is input to the substrate inspection unit directly by the vertical transportation unit or via a delivery stage in the delivery stage group. The substrate inspection unit may be disposed in the delivery stage group.
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申请公布号 |
US2011032494(A1) |
申请公布日期 |
2011.02.10 |
申请号 |
US20100909191 |
申请日期 |
2010.10.21 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
MATSUOKA NOBUAKI;HAYASHI SHINICHI;HAYASHIDA YASUSHI;HARA YOSHITAKA |
分类号 |
G03B27/32 |
主分类号 |
G03B27/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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