CHARGED PARTICLE BEAM EXPOSURE METHOD AND DEVICE, CHARGED PARTICLE BEAM EXPOSURE DATA GENERATING METHOD AND PROGRAM, AND BLOCK MASK

摘要

PROBLEM TO BE SOLVED: To provide a charged particle beam exposure method that improves the throughput.

SOLUTION: A charged particle beam exposure device includes a first aperture 65 which forms an electron beam emitted from an electron gun 64 into a rectangular having a predetermined size, a second aperture 66 which shapes the electron beam which is shaped into a rectangular having a predetermined size with the first aperture 65 into a rectangular having an arbitrary size, and a block mask 67 which shapes the electron beam which is shaped into the rectangular having an arbitrary size with the second aperture 66 into a pattern form for one-shot exposure.

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