| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus and an exposure method, with which a pattern of a mask can be transferred by exposure with high accuracy according to an exposure object region of a workpiece even when the workpiece is distorted. <P>SOLUTION: The exposure method includes the steps of detecting an alignment mark of a workpiece 12 and an alignment mark of a mask 21 through an alignment camera 52; calculating the displacement amount of the mask 21 and the workpiece 12 and the distortion amount of the workpiece 12, on the basis of the misalignment amounts of the alignment marks detected by the alignment camera 52; adjusting the alignment of the workpiece and the mask on the basis of the calculated displacement amount; and correcting the curvature of a planar mirror 66 as a reflecting mirror that reflects a beam of exposure light from a light source 61, on the basis of the calculated distortion amount at the same time or another time of the alignment-adjusting step. <P>COPYRIGHT: (C)2011,JPO&INPIT |
