| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a synthetic quartz glass substrate for excimer laser which is used for a synthetic quartz mask substrate for photomask, for example, used for excimer laser, particularly ArF excimer laser and further ArF immersing technology, so-called for a reticle material, has excellent transmittance and uniform transmittance distribution, is small in the degradation and has low birefringence, and synthetic quartz glass to become a material for a substrate for an optical component for a high precision display. <P>SOLUTION: In a heat treatment method of the synthetic quartz glass by piling up a plurality of synthetic quartz glass blocks and heat-treating the blocks in an atmospheric furnace, the quartz glass block is a polygonal pillar or a circular column, in which the height is shorter than a diagonal line of the bottom face of the polygonal pillar or the outside diameter of the bottom of the circular column. The heat treatment is carried out by piling up the blocks with a space between the blocks without bringing them into contact with each other. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
