PATTERN EVALUATION METHOD, METHOD FOR FORMING PATTERN, PATTERN EVALUATION PROGRAM

摘要

PROBLEM TO BE SOLVED: To provide a pattern evaluation method for evaluating a proximity pattern that influences a shape of a circuit pattern prior to lithographic verification.

SOLUTION: The pattern evaluation method includes: a proximity pattern formation step of forming a SRAF (sub-resolution assist feature) that influences the resolution performance of a circuit pattern in the periphery of a target pattern of the circuit pattern to be formed on a substrate by using the target pattern; an interference map formation step of forming an interference map by using the target pattern, the interference map relating to the distribution of influence degrees on the resolution performance of the circuit pattern when a prescribed pattern is disposed in the periphery of the target pattern; a score calculation step of calculating the influence degree as a score of the SRAF on the resolution performance of the circuit pattern by comparing the interference map with the SRAF; and an evaluation step of evaluating whether or not the SRAF is disposed in an appropriate position in accordance with the shape of the circuit pattern on the basis of the score.

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