发明名称 ACTIVE MATRIX SUBSTRATE MANUFACTURING METHOD, AND ACTIVE MATRIX SUBSTRATE OBTAINED BY THE METHOD
摘要 PROBLEM TO BE SOLVED: To provide an effective active matrix substrate which has a sufficiently small number of film defects, and thereby has a sufficiently high reliability, and can easily be manufactured, and to provide a method for manufacturing the substrate. SOLUTION: The method for manufacturing the active matrix substrate includes: a step of forming an organic protection film for a switching element on a substrate on which the switching element is formed and which at least partially has a surface portion whose contact angle with water is 20°or below (organic protection film formation step). The method for manufacturing the active matrix substrate includes: a step of forming the switching element on the substrate (switching element formation step); and a combination step of combining a subsequent step, with at least once, for adjusting the contact angle of at least a portion of the substrate surface, where the switching element is formed, with water to be 20°or below (contact angle adjustment step) and a step of forming the organic protection film on the substrate surface. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011029212(A) 申请公布日期 2011.02.10
申请号 JP20070313588 申请日期 2007.12.04
申请人 NIPPON ZEON CO LTD 发明人 SHINDO HIROAKI
分类号 H01L29/786;G02F1/1333;G02F1/1368;G09F9/30;H01L21/336 主分类号 H01L29/786
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