| 摘要 |
A fabricating method for a pixel structure is provided. First, a substrate having an active device and a capacitor electrode line thereon is provided. Next, a passivation layer is formed on the substrate to cover the active device. After that, a light shielding layer is formed on the passivation layer to define a unit area. Next, an ink-jet printing is performed to form a color filter pattern within the unit area defined by the light shielding layer. After that, a portion of the color filter pattern is removed to form a first hole above active device. Next, the passivation layer exposed by the first hole is removed so as to form a contact hole exposing a portion of the active device. After that, a pixel electrode is formed on the color filter pattern to fill into the contact hole so as to electrically connect with active device.
|
