发明名称 |
SUPER-HYDROPHOBIC PHOTOSENSITIVE RESIN COMPOSITION AND BLACK MATRIX THEREOF |
摘要 |
Provided is a super-hydrophobic photosensitive resin composition for preparing a black matrix used to block light in a liquid crystal display. More specifically, a super-hydrophobic photo-sensitive resin composition for preparing a black matrix having superior heat resistance, chemical resistance, development process margin and adhesivity, including a first polymer and a second polymer and a black matrix prepared therefrom are disclosed. |
申请公布号 |
WO2011016655(A2) |
申请公布日期 |
2011.02.10 |
申请号 |
WO2010KR05074 |
申请日期 |
2010.08.02 |
申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.;CHOI, GYUNG-SIK;HAN, SEOK;LEE, MOO YOUNG |
发明人 |
CHOI, GYUNG-SIK;HAN, SEOK;LEE, MOO YOUNG |
分类号 |
G03F7/027;G03F7/004;G03F7/028 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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