发明名称 SUPER-HYDROPHOBIC PHOTOSENSITIVE RESIN COMPOSITION AND BLACK MATRIX THEREOF
摘要 Provided is a super-hydrophobic photosensitive resin composition for preparing a black matrix used to block light in a liquid crystal display. More specifically, a super-hydrophobic photo-sensitive resin composition for preparing a black matrix having superior heat resistance, chemical resistance, development process margin and adhesivity, including a first polymer and a second polymer and a black matrix prepared therefrom are disclosed.
申请公布号 WO2011016655(A2) 申请公布日期 2011.02.10
申请号 WO2010KR05074 申请日期 2010.08.02
申请人 ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.;CHOI, GYUNG-SIK;HAN, SEOK;LEE, MOO YOUNG 发明人 CHOI, GYUNG-SIK;HAN, SEOK;LEE, MOO YOUNG
分类号 G03F7/027;G03F7/004;G03F7/028 主分类号 G03F7/027
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