| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a system which reduces pollution in an immersion lithographic apparatus, and reduces an interruption time for cleaning the immersion lithographic apparatus if not eliminated. <P>SOLUTION: A cleaner (for instance, an active cleaning agent) is added to immersion liquid in order to clean and/or prevent accumulation of pollution during exposure of a substrate to clean the immersion lithographic apparatus. For the cleaner, a surface-active agent, a cleaning agent, soap, an acid, an alkali, a solvent (nonpolar organic solvent, polar organic solvent or the like), another optional cleaning agent appropriate for a lithographic apparatus or the like is used. The cleaning agent may be present at a concentration <300 ppb. <P>COPYRIGHT: (C)2011,JPO&INPIT |
