发明名称 SURFACE INSPECTION SYSTEM
摘要 PURPOSE:To facilitate direct checking for presence and effect of a foreign matter previously detected, by performing an operation in the second mode after a foreign matter or the like is detected on a semiconductor wafer in the first mode to display the current condition at the position where the foreign matter was detected. CONSTITUTION:This system has first and second modes. Information on the position in an observation view where a foreign matter or the like is detected is displayed on a TV receiver 32 in the first mode while a taken image is memorized into an image memory 40 through a control circuit 42. Then, in the second mode, based on information on the position memorized in the memory 40, the positioning of the observation view is done and the current taken image is displayed on the TV receiver 32 while the taken image corresponding to the position in the observation view memorized in the memory 40 is displayed on a TV receiver 44.
申请公布号 JPS62261043(A) 申请公布日期 1987.11.13
申请号 JP19860103595 申请日期 1986.05.06
申请人 HITACHI ELECTRONICS ENG CO LTD;HITACHI LTD 发明人 TANIUCHI TOSHIAKI;TANABE YOSHIKAZU;NEMOTO RYOJI;OTANI MASAFUMI
分类号 H01L21/66;G01N21/88;G01N21/94;G01N21/956 主分类号 H01L21/66
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