| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate cleaning device and a substrate cleaning method, for cleaning an entire surface of a substrate in a short time. SOLUTION: In a bottom surface of a cleaning head 60, four hole arrays NR are provided each of which comprises 20 discharge holes arrayed linearly at predetermined array intervals. Further, a piezoelectric element is stuck on an outer wall surface of the cleaning head 60. While a cleaning solution is supplied into the cleaning head 60, vibrations are imparted to the cleaning solution by the piezoelectric element and then droplets of the cleaning solution which have a constant diameter are generated and successively discharged at a constant speed from the 80 discharge holes 64 in total. When the droplets are discharged from the cleaning head 60, the cleaning head 60 is scanned between a center part and an end edge of the substrate W while a cover rinse liquid is discharged from a cover rinse nozzle 80 onto an upper surface of the substrate W. Thus, the droplets are discharged from the 80 discharge holes 64 to clean the entire surface of the substrate W in a short cleaning time. COPYRIGHT: (C)2011,JPO&INPIT |
