| 发明名称 |
COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST |
| 摘要 |
Coating compositions for use with an overcoated photoresist are provided where the coating composition comprises a resin containing cyanurate groups and hydrophobic groups. The coating composition can enhance resolution of an overcoated photoresist relief image.
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| 申请公布号 |
US2011033801(A1) |
申请公布日期 |
2011.02.10 |
| 申请号 |
US20100782397 |
申请日期 |
2010.05.18 |
| 申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS LLC |
发明人 |
ZAMPINI ANTHONY;WAYTON GERALD B.;JAIN VIPUL;LIU CONG;COLEY SUZANNE;ONGAYI OWENDI |
| 分类号 |
G03F7/004;C09D177/00;G03F7/20 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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