摘要 |
The invention relates to a flange (4) for a CVD reactor (1) to which a camera, particularly a thermal imaging camera (10), has been attached by means of a fastening device (5), wherein the camera may be oriented such that at least one of the silicon rods (15) located in the CVD reactor (1) is captured. The invention further relates to a use of a camera, particularly a thermal imaging camera (10), for determining the diameter D of silicon rods (15) during the deposition process of pure silicon when conducting a CVD method. In addition, the invention relates to a CVD method for producing silicon rods (15) wherein the fluid volume of the process gas supplied is a function of the diameter D of the silicon rods (15). |