| 摘要 |
PURPOSE: A method for manufacturing 3-axis accelerometer is provided to minimize the occupied area by realizing x-axis, y-axis and z-axis devices at the same time. CONSTITUTION: A TEOS(Tetra Ethyl Ortho Silicate) is deposited at the upper part of a wafer(10). A plurality of first trenches(21) are formed through a first etching process. A photoresist(15) is deposited only between the formation parts of z-axis devices. The second etching process is progressed. The lower part of the trench is removed. The third etching process is progressed. Additionally, the lower part of the first trench is etched. A first cavity is formed at the lower part of the first trench through wet etching. |
