| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure method for ensuring good alignment at an end in moving direction of an exposure region when forming coloring pixels in slit exposure for a pattern of a black matrix. <P>SOLUTION: The exposure method uses an exposure device provided with a front imaging camera CM-A obtaining position information of an alignment mark of a first pattern in a reverse moving direction of a substrate 50 from an optical axis, and a rear imaging camera CM-B in a moving direction, uses a photomask provided with a front imaging opening 53-A and a rear imaging opening 53-B for imaging the alignment mark, images the alignment mark moving below the photomask PM3 with a front imaging camera or/and a rear imaging camera, and aligns the pattern of the photomask for the first pattern from position information of the obtained alignment mark to radiate exposure light. <P>COPYRIGHT: (C)2011,JPO&INPIT |
