| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a barrier film having extremely high barrier performance, to use the film as a resin base material for an organic photoelectric conversion element, and to obtain a device such as an organic photoelectric conversion element having high durability by using the resin base material for an organic photoelectric conversion element. <P>SOLUTION: A method for producing the barrier film is characterized by applying a liquid containing at least one kind of silicon compound onto at least one surface of a base material, then drying the applied liquid at 20-120°C to form a thin film, and without performing a heating treatment at a temperature of≥140°C on the thin film, laminating a thin film of at least one kind of silicon compound on the base material, on which the thin film has been applied and formed, by a plasma CVD process using a reactive gas containing the silicon compound and oxygen. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
