发明名称 NONVOLATILE MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 According to one embodiment, a nonvolatile memory device includes a substrate, a first electrode, a second electrode, a third electrode, a first memory portion and a second memory portion. The first electrode extends in a first direction and is provided on the substrate. The second electrode extends in a second direction crossing the first direction and is provided on the first electrode. The third electrode extends in a third direction crossing the second direction and is provided on the second electrode. The first memory portion is provided between the first and the second electrodes and has a first oxygen composition ratio and a first layer thickness. The second memory portion is provided between the second and the third electrodes and has at least one of a second oxygen composition ratio different from the first oxygen composition ratio and a second layer thickness different from the first layer thickness.
申请公布号 US2011031468(A1) 申请公布日期 2011.02.10
申请号 US20100885599 申请日期 2010.09.20
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 FUKUMIZU HIROYUKI;BOTA NORIKO
分类号 H01L27/24;H01L21/02 主分类号 H01L27/24
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