| 发明名称 |
STAGE UNIT, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a stage unit capable of suppressing temperature variation due to vaporization heat. <P>SOLUTION: A substrate stage 2 is configured to carry out immersion exposure using a liquid LQ, and includes a porous body flow passage 50 made of a porous body which recovers a contacting liquid LQ and holds the liquid LQ, the porous body flow passage 50 including an extension part L extending in a direction including a perpendicular component. <P>COPYRIGHT: (C)2011,JPO&INPIT |
| 申请公布号 |
JP2011029546(A) |
申请公布日期 |
2011.02.10 |
| 申请号 |
JP20090176353 |
申请日期 |
2009.07.29 |
| 申请人 |
NIKON CORP |
发明人 |
TAKAIWA HIROAKI;HARA HIDEAKI |
| 分类号 |
H01L21/027;G03F7/20;H01L21/68 |
主分类号 |
H01L21/027 |
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