| 发明名称 |
LIGHT IRRADIATION APPARATUS FOR EXPOSURE APPARATUS, EXPOSURE APPARATUS, AND EXPOSURE METHOD |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a light irradiation apparatus for an exposure apparatus, an exposure apparatus and an exposure method, the light irradiation apparatus decreasing the time for replacing a light source part and the time for stopping the apparatus. <P>SOLUTION: The light irradiation apparatus 80 includes: a plurality of light source parts 73 each of which includes a lamp 71 and a reflection mirror 72 that cause the light emitted from the lamp 71 to be transmitted out directionally; a plurality of cassettes 81 each of which can be equipped with the preset number of light source parts 73; and a frame 82 which can be equipped with a plurality of the cassettes 81. <P>COPYRIGHT: (C)2011,JPO&INPIT |
| 申请公布号 |
JP2011028184(A) |
申请公布日期 |
2011.02.10 |
| 申请号 |
JP20090180643 |
申请日期 |
2009.08.03 |
| 申请人 |
NSK LTD |
发明人 |
HARADA TOMONORI;NAGAI SHINICHIRO;KARUISHI SHUSAKU |
| 分类号 |
G03F7/20;F21S2/00;H01L21/027 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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