Wolfram- und Molybdän-Verbindungen und ihre Verwendung für die Chemical Vapour Deposition (CVD)

摘要

Tungsten- and molybdenum compound (I), is new. Tungsten- and molybdenum compound of formula (I), is new. M : W or Mo; R1>, R2>1-12C-alkyl, 5-12C-cycloalkyl, 6-10C-aryl, 1-alkenyl, 2-alkenyl, 3-alkenyl, triorganosilyl residue of formula SiR3 or amino residue of formula NR2 (all optionally substituted); R : 1-4C-alkyl; R3>, R4>1-8C-alkyl, 5-10C-cycloalkyl, 6-14C-aryl, SiR3 or NR2 (all optionally substituted); and R5>, R6>1-12C-alkyl, 5-12C-cycloalkyl, 6-10C-aryl (all optionally substituted) or H. Independent claims are included for: (1) the preparation of (I); (2) tungsten- and/or molybdenum containing layer, prepared by means of chemical vapor deposition method using (I) as a precursor; and (3) a substrate comprising the tungsten- and/or molybdenum containing layer. [Image]