| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition apparatus suppressing deposits to be adhered to a surface of a member exposed to the atmosphere in a treatment container. SOLUTION: The film deposition apparatus deposits a thin film on a surface of an object W to be treated by using organic metal gas within a treatment container 4 which can be evacuated, wherein a hydrophobic layer is provided on the surface of the member exposed to the atmosphere in the treatment container. Thus, deposits to be adhered to the surface of the member exposed to the atmosphere in the treatment container are suppressed. COPYRIGHT: (C)2011,JPO&INPIT |
