| 摘要 |
Polarization evaluation mask according to one mode includes a transparent substrate, a light shielding portion, plural quarter-wavelength plates, and plural polarizers. The light shielding portion is formed on the transparent substrate and has plural openings therein. Plural quarter-wavelength plates are formed to cover at least one opening. Fast axes of the quarter-wavelength plates are different in azimuth by a certain angle. Plural polarizers are disposed upstream of the quarter-wavelength plates with respect to the illumination light and formed to overlay the quarter-wavelength plates and cover at least one of the openings. Transmission axes of the polarizers are different in azimuth by a certain angle. The plural openings are provided with different combinations of an azimuth, of the polarizer and an azimuth of the quarter-wavelength plate from one another.
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