发明名称 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
摘要 Cyanurate compositions are provided that are particularly useful as a reagent to form a resin component of a coating composition underlying an overcoated photoresist. Preferred isocyanurates compound comprise substitution of multiple cyanurate nitrogen ring atoms by at least two distinct carboxy and/or carboxy ester groups.
申请公布号 US2011033800(A1) 申请公布日期 2011.02.10
申请号 US20100782350 申请日期 2010.05.18
申请人 ROHM AND HAAS ELECTRONIC MATERIALS LLC 发明人 ZAMPINI ANTHONY;JAIN VIPUL;LIU CONG;COLEY SUZANNE;ONGAYI OWENDI
分类号 G03F7/004;C07D251/34;C08G73/08;G03F7/20 主分类号 G03F7/004
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