| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid processing apparatus that not only prevent an atmospheric air of a lower surface side of a substrate to which a processing liquid is supplied from circulating and being introduced into an upper surface side of the substrate to which the processing liquid is not supplied but also suppresses consumption of a purge gas to be supplied for separating the atmosphere between the upper and lower surface sides from each other. SOLUTION: In the liquid processing apparatus 2 for supplying the processing liquid to the lower side of the substrate horizontally held, an enclosure part member 4 receives the processing liquid scattered from the substrate W, and an upper plate 5 is disposed facing the upper surface of the substrate W horizontally held. Gas supplying parts 53 and 531 supply a pressurized gas to a space formed between the upper plate 5 and the substrate W. Also, the atmospheric gas outside the space is introduced into the space via a gas inlet port 52 by negative pressure generated in a space formed between the upper plate 5 and substrate W. COPYRIGHT: (C)2011,JPO&INPIT |
