| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for obtaining a silicon thin film having a structure wherein a contact layer of high conductivity and an intrinsic silicon layer are laminated by a simpler method to which a coating method is applied. SOLUTION: A coating liquid wherein a chain higher order silane compound B, a compound containing a metal M and a solvent C are mixed is prepared, wherein the solvent C includes a compound having a lower boiling point than the higher order silane compound B and interacting with the metal M. A coating film 3 is formed on a substrate 1 by using the coating liquid. The solvent C is removed from the coating film 3 to dry. At this time, the coating film 3 is heated. Thereby the silicon thin film 5 with a large content of the metal M is formed on the surface side. COPYRIGHT: (C)2011,JPO&INPIT
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