发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a structure that eliminates the need to grind or cut a sealing resin and heat radiation surfaces so as to expose the heat radiation surfaces from the sealing resin. <P>SOLUTION: In the semiconductor device, a concave section 43 is provided to a second heat sink 40, and a first sealing resin 50 is provided in the concave section 43. Thus, the first sealing resin 50 is arranged in the concave section 43, so that a second heat radiation surface 41 positioned on the opposite side from a bottom surface 44 of the concave section 43 is not buried in the first sealing resin 50. Further, a top surface 51 of the first sealing resin 50 is positioned on the side of a first end surface 12 with respect to a first radiation surface 11. Consequently, the first heat radiation surface 11 is not covered with the first sealing resin 50 to be buried. Therefore, there is no need to grind or cut the first sealing resin 50 and the respective heat radiation surfaces 11 and 41 so as to expose the respective heat radiation surfaces 11 and 41 from the first sealing resin 50. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011029589(A) 申请公布日期 2011.02.10
申请号 JP20100022340 申请日期 2010.02.03
申请人 DENSO CORP 发明人 NISHIHATA MASAYOSHI;OKURA YASUTSUGU
分类号 H01L23/34;H01L23/28 主分类号 H01L23/34
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