| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus to execute highly precise exposure while maintaining defocus distortion minimal and stably enabling desirable illuminance distribution (e.g. uniform distribution) onto a substrate, even when a numerical aperture of an optical system is large or exposure conditions such as an illumination mode change in various kinds. <P>SOLUTION: The exposure apparatus includes an illumination optical system to illuminate a reticle by utilizing light from a light source, a projection optical system to project a pattern of the reticle onto a substrate, and a variable diaphragm having an opening for regulating an illuminated region on the substrate, the variable diaphragm being disposed near a position conjugate to the substrate. A position of the variable diaphragm is variable in an optical axis direction of the illumination optical system or the projection optical system. <P>COPYRIGHT: (C)2011,JPO&INPIT |
