发明名称 |
SPACER FILL STRUCTURE, METHOD AND DESIGN STRUCTURE FOR REDUCING DEVICE VARIATION |
摘要 |
A design structure is provided for spacer fill structures and, more particularly, spacer fill structures, a method of manufacturing and a design structure for reducing device variation is provided. The structure includes a plurality of dummy fill shapes in different areas of a device which are configured such that gate perimeter to gate area ratio will result in a total perimeter density being uniform across a chip. |
申请公布号 |
EP2281303(A1) |
申请公布日期 |
2011.02.09 |
申请号 |
EP20090798429 |
申请日期 |
2009.06.18 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
ANDERSON, BRENT, A.;BRYANT, ANDRES;NOWAK, EDWARD J.;RANKIN, JED, H |
分类号 |
H01L21/334;G06F17/50 |
主分类号 |
H01L21/334 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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