发明名称 METHOD OF CREATING ALIGNMENT/CENTERING GUIDES FOR SMALL DIAMETER, HIGH DENSITY THROUGH-WAFER VIA DIE STACKING
摘要 <p>A method is provided for forming a die stack. The method includes forming a plurality of through-wafer vias and a first plurality of alignment features in a first die. A second plurality of alignment features is formed in a second die, and the first die is stacked on the second die such that the first plurality of alignment features engage the second plurality of alignment features. A method of manufacturing a die stack is also provided that includes forming a plurality of through-wafer vias on a first die, forming a plurality of recesses on a first die, and forming a plurality of protrusions on a second die. A die stack and a system are also provided.</p>
申请公布号 EP2281305(A1) 申请公布日期 2011.02.09
申请号 EP20090729476 申请日期 2009.03.17
申请人 MICRON TECHNOLOGY, INC. 发明人 PRATT, DAVE
分类号 H01L23/544;H01L21/60;H01L21/98;H01L23/48;H01L25/065;H01L29/06 主分类号 H01L23/544
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