发明名称 PHOTOSENSITIVE RESIN AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME
摘要 Disclosed is a photosensitive resin which can be produced readily at a low cost, is easy to adjust its cross-linking density and acid value, and has excellent properties including high heat resistance, high transparency, a high refractive index and a low linear expansion coefficient. The photosensitive resin is produced by adding a (meth)acrylate compound having reactivity to a carboxylic acid and represented by general formula (2) to a polymeric compound, wherein the polymeric compound is produced by reacting a compound having a fluorene skeleton and represented by general formula (1) with a tetrabasic acid dianhydride. [In general formula (1), the rings Z1 and Z2 independently represent an aromatic hydrocarbon group; R1a and R1b independently represent a hydrogen atom or a substituent; R2a and R2b independently represent a substituent other than a hydrogen atom; R3a and R3b independently represent a hydrogen atom or a methyl group; k1 and k2 independently represent an integer of 0 to 4; m1 and m2 independently represent an integer of 0 to 3; n1 and n2 independently represent an integer of 0 to 10; and p1 and p2 independently represent an integer of 0 to 4.] [In general formula (2), R4 represents ahydrogen atom or a methyl group; and R5 represents a group represented by general formula (5).] [In general formula (5), q, r and s independently represent an integer of 0 to 9, provided that it is impossible that all of q, r and s represent 0 simultaneously.]
申请公布号 KR20110013363(A) 申请公布日期 2011.02.09
申请号 KR20107022039 申请日期 2009.03.25
申请人 SOKEN CHEMICAL & ENGINEERING CO., LTD.;OSAKA GAS COMPANY LIMITED 发明人 UTSUNOMIYA SHIN;MIYAUCHI SHINSUKE;NAGASHIMA TAICHI;YAMAGUCHI NAOKI;KAWASAKI SHINICHI
分类号 G03F7/027;C08F290/06;C08G63/91 主分类号 G03F7/027
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