发明名称 SUBSTRATE TREATING APPARATUS
摘要 PURPOSE: A substrate processing apparatus is provided to prevent the wrong wiring during the circuit wiring work by a worker by connecting various electronic devices and the control units. CONSTITUTION: A chemical processing unit(120) processes the process by using chemical. The chemical processing unit comprises an etching unit, a cleaning unit(124), a rinse unit(126), and a drying unit(128). A controller controls the chemical processing unit and an unloader(130). The controller is electrically connected to the loader, the chemical processing unit, and the unloader by using a plurality of cables(106).
申请公布号 KR20110011908(A) 申请公布日期 2011.02.09
申请号 KR20090069376 申请日期 2009.07.29
申请人 SEMES CO., LTD. 发明人 NAM, KI SUN;LEE, JOONG EON;YOO, HEUNG RYOL
分类号 H01L21/302 主分类号 H01L21/302
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