LITHOGRAPHIC APPARATUS AND MONITORING METHOD

摘要

PURPOSE: A lithography apparatus and a monitoring method are provided to inspect whether a radiation beam provides an illumination mode with high quality by supplying information about the mixture of divergence and spatial coherence of the radiation beam. CONSTITUTION: A lithography apparatus comprises a radiation beam monitoring apparatus. An optical member generates a diffraction pattern. An imaging detector(22) is positioned behind the optical member and detects the mixture of divergence and spatial coherence of the radiation beam of a lithography device. An analyzer(24) measures the property of the image detected by the imaging detector.