A CLEANING METHOD IN ETCHING PROCESS

摘要

PURPOSE: A cleaning method in etching process is provided to prevent the remnant of alkaline component by adding a process of cleaning with the weak acid solution after cleaning with the alkaline solution for removing the acid solution. CONSTITUTION: The etching of the glass substrates is implemented using the acid solution(S10). A glass substrates is dipped into the distilled water after the etching process(S20). The glass substrate is washed with the alkaline solution for the removal of the acid component remaining on the glass substrate(S30).