PURPOSE: A plating device is provided to improve the plating efficiency by forming a flow field for directly supplying plating liquid to an object as well as an electric filed. CONSTITUTION: A plating device comprises an anode electrode(10), a cathode electrode(30), and a plating bath(40). The anode electrode comprises an insoluble anode(12) with an electrode surface, an insulation part(20) for electrically insulating the parts except the electrode surface, and an anode basket(16) accommodating a soluble electrode(17). The cathode electrode is electrically connected to the object. The plating bath accommodates plating liquid in which the anode and the cathode electrode are submerged.
申请公布号
KR20110012035(A)
申请公布日期
2011.02.09
申请号
KR20090069574
申请日期
2009.07.29
申请人
SAMSUNG ELECTRO-MECHANICS CO., LTD.
发明人
CHOI, YUNN HONG;YOO, DAL HYUN;PARK, CHANG HWAN;LEE, HYO SEOK