发明名称 METHOD OF FABRICATING A DEVICE USING LOW TEMPERATURE ANNEAL PROCESSES, A DEVICE AND DESIGN STRUCTURE
摘要 <p>PURPOSE: A method for manufacturing a device, the device, and a design structure are provided to improve the performance of the device by controlling a stacking force using a low temperature annealing process. CONSTITUTION: A stress liner is formed on a gate structure(12). A stacking force is formed by processing the gate structure and the stress liner with a low temperature annealing process. A stress liner is stripped from the gate structure. An activation annealing process is executed on the gate structure.</p>
申请公布号 KR20110013240(A) 申请公布日期 2011.02.09
申请号 KR20100070235 申请日期 2010.07.21
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 WANG YUN YU;DEMENICUCCI ANTHONY GENE;KANE TERENCE LAWRENCE;NUMMY KAREN A.;NARASIMHA SHREESH;ONTALUS VIOREL
分类号 H01L21/336;H01L21/324;H01L29/78 主分类号 H01L21/336
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