发明名称 |
METHOD OF FABRICATING A DEVICE USING LOW TEMPERATURE ANNEAL PROCESSES, A DEVICE AND DESIGN STRUCTURE |
摘要 |
<p>PURPOSE: A method for manufacturing a device, the device, and a design structure are provided to improve the performance of the device by controlling a stacking force using a low temperature annealing process. CONSTITUTION: A stress liner is formed on a gate structure(12). A stacking force is formed by processing the gate structure and the stress liner with a low temperature annealing process. A stress liner is stripped from the gate structure. An activation annealing process is executed on the gate structure.</p> |
申请公布号 |
KR20110013240(A) |
申请公布日期 |
2011.02.09 |
申请号 |
KR20100070235 |
申请日期 |
2010.07.21 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
WANG YUN YU;DEMENICUCCI ANTHONY GENE;KANE TERENCE LAWRENCE;NUMMY KAREN A.;NARASIMHA SHREESH;ONTALUS VIOREL |
分类号 |
H01L21/336;H01L21/324;H01L29/78 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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