| 摘要 |
<p>Disclosed is a sputtering target for forming an optical thin film formed of oxides of four elements of indium, tin, zinc and magnesium and comprising a compound phase of (In 2 O 3 ) (ZnO)m (wherein 1 ‰¦ m ‰¦ 10) and (In 2 O 3 ) (MgO)n (wherein 1 ‰¦ n ‰¦ 2), wherein the tin content in relation to the total amount based on SnO 2 conversion is 5 to 30 mol%, and the magnesium content in relation to the total amount based on MgO conversion is 3 to 25 mol%. A target formed of an In 2 O 3 -ZnO-SnO 2 composite oxide can be improved. Specifically, provided is a sputtering target capable of improving the extinction coefficient in the blue laser region around 400 nm of the sputtered film and that is used for forming an optical thin film having a stable amorphous nature, and an amorphous optical thin film that is deposited on a substrate using the target.</p> |
