发明名称 MASK BLANK AND PHOTO MASK
摘要 [PROBLEMS] To provide a large-size mask and a mask blank for FPD for manufacturing an FPD device appropriate for multi-color wave exposure. [MEANS FOR SOLVING PROBLEMS] A mask blank includes a light shielding film having a lower layer portion having the light shielding function and an upper layer portion having the reflection preventing function formed on a translucent substrate. The light shielding film is controlled so that a fluctuation width of the film surface reflectance is below 1% in a wavelength band at least from i-line to g-line emitted from an ultra high pressure mercury lamp.
申请公布号 KR20110013573(A) 申请公布日期 2011.02.09
申请号 KR20117001256 申请日期 2006.11.15
申请人 HOYA CORPORATION 发明人 MITSUI MASARU
分类号 H01L21/027;G03F1/48 主分类号 H01L21/027
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