APPARATUS FOR SUPPLYING GAS

摘要

PURPOSE: A gas supply apparatus is provided to uniformly mix a plurality of process gases by mixing the plurality of process gases and forming the vortex flow in the mixed process gases. CONSTITUTION: A plurality of gas supply sources(110) supplies the different process gas required for the process of a substrate. A mixing unit(120) mixes the process gases supplied from the gas supply source. The gas mixing unit comprises a first flow path(122) and a second flow path(124) for mixing the process gases supplied from the gas supply sources into one gas.