A CLEAN APPRATUS COUPLING METAL ORGANICE CHEMICALA VAPOR DEPOSITION APPRATUS

摘要

PURPOSE: A cleaning apparatus combined with an organic metal chemical vapor deposition apparatus is provided to implement the cleaning process rapidly by cleaning a wafer carrier deposited with the deposition material generated during the organic metal chemical deposition using additional cleaning device. CONSTITUTION: A processing chamber(110) implements the deposition process of a wafer. A wafer transfer module(200) transfers a wafer carrier(130) located within the processing chamber. The wafer transfer module comprises a robot body(210) and a robot arm(220) which can be rotated centered on the robot body.