发明名称 |
Method and apparatus for generating charged particles for deposition on a surface |
摘要 |
A method for establishing a calibrating standard for wafer inspection includes depositing solid ionized particles of a known size range with an aerosol onto a wafer. The method also includes depositing particles onto a wafer in a deposition chamber by using an aerosol stream and the solid particles suspended in a gas; ionizing the aerosol stream with a negative or positive charge polarity or both by passing the aerosol stream through a non-radioactive ionizer to produce charged particles and supplying such aerosol stream to the deposition chamber. An apparatus for producing charged particles includes an atomizer and a non-radioactive ionizer in fluid communication with each other. The apparatus may also include an electrospray droplet generator for producing an aerosol with dry-solid particles and an ionizer that ionizes the molecules of the gas. The apparatus may also include a generator for generating an aerosol with particles suspended in the gas with a non-radioactive ionizer that ionizes the gas in the aerosol causing the aerosol particles to be charged. The apparatus may further include an electrostatic classifier for classifying the charged particles to a selected size range.
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申请公布号 |
US7882799(B2) |
申请公布日期 |
2011.02.08 |
申请号 |
US20050252252 |
申请日期 |
2005.10.17 |
申请人 |
MSP CORPORATION |
发明人 |
DICK WILLIAM;LIU BENJAMIN Y. H. |
分类号 |
B05B5/00;B05B5/025;B05C19/00 |
主分类号 |
B05B5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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