发明名称 Lithographic apparatus and pivotable structure assembly
摘要 A mirror assembly to interact with a beam of radiation of a lithographic apparatus is disclosed. The mirror assembly includes a mirror, a piezo electric actuator, and a mover structure, the mover structure connected to the mirror, an assembly of the mirror and the mover structure being pivotable about a pivot point, the piezo electric actuator having a contacting surface to establish a slip-stick contact with the mover structure.
申请公布号 US7884920(B2) 申请公布日期 2011.02.08
申请号 US20070812228 申请日期 2007.06.15
申请人 ASML NETHERLANDS B.V. 发明人 SOEMERS HERMANUS MATHIAS JOANNES RENE;PEETERS FELIX GODFRIED PETER
分类号 G03B27/42 主分类号 G03B27/42
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