| 摘要 |
PURPOSE: An APCVD(Atmospheric Pressure Chemical Vapor Deposition) apparatus for forming a multilayer thin film with high efficiency and anti-reflection for high efficiency solar cell equipment is provided to improve deposition speed by depositing a thin film at the atmospheric pressure. CONSTITUTION: A transfer unit continuously transfer a substrate(130) in a reaction chamber. A plurality of nozzles(150a,150b,150c) are installed on the upper side of a transfer path of the substrate to correspondingly face the substrate one by one. A gas supply unit supplies reactive gas to each nozzle with a different ratio. A substrate heating unit heats the substrate with a process temperature. A multilayer thin film with different property is formed on the substrate with an in-situ type.
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