发明名称 Laser thin film poly-silicon annealing optical system
摘要 A high, energy, high repetition rate workpiece surface heating apparatus is disclosed which comprise a XeF laser producing a laser output light pulse beam, an optical system narrowing the laser output light pulse beam in the short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of the long axis, the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece.
申请公布号 US7884303(B2) 申请公布日期 2011.02.08
申请号 US20050201877 申请日期 2005.08.11
申请人 TCZ LLC 发明人 PARTLO WILLIAM N.;DAS PALASH P.;HUDYMA RUSSELL;THOMAS MICHAEL
分类号 B23K26/00;B23K26/06;B23K26/073;C30B1/02;C30B13/24;H01L21/20;H01S3/22;H01S3/223 主分类号 B23K26/00
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