<p>PURPOSE: A substrate processing apparatus is provided to improve the strip efficiency of a photo-resist by improving the rate of vapor state water with respect to a sulfuric acid solution inside a chamber. CONSTITUTION: A space is formed inside a chamber(10). A top lid(20) is combined with the chamber in order to open and close the space of the chamber. A turn-table(30) is installed in the space of the chamber to be rotatable. A cassette(40) loads a plurality of substrates along the height direction of the chamber. A first nozzle(60) is installed to one side of the chamber and sprays fluid toward the space of the chamber.</p>
