发明名称 Semiconductor integrated circuit
摘要 A semiconductor integrated circuit according to an example of the present invention includes a semiconductor substrate, an element isolation insulating layer formed in a surface region of the semiconductor substrate, and first and second MIS type devices isolated from each other by the element isolation insulating layer and formed in adjacent first and second element regions in a second direction orthogonal to a first direction. Each of the first and second MIS type devices has a stack gate structure having a floating gate and a control gate electrode. The first MIS type device functions as an aging device, and the second MIS type device functions as a control device which controls an electric charge retention characteristic of the aging device.
申请公布号 US7884416(B2) 申请公布日期 2011.02.08
申请号 US20070853415 申请日期 2007.09.11
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 WATANABE HIROSHI;NISHIYAMA AKIRA
分类号 H01L29/788 主分类号 H01L29/788
代理机构 代理人
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