发明名称 |
BORON-CONTAINING HYDROGEN SILSESQUIOXANE POLYMER, INTEGRATED CIRCUIT DEVICE FORMED USING THE SAME, AND ASSOCIATED METHODS |
摘要 |
<p>PURPOSE: A boron-containing hydrogen silsesquioxane polymer is provided to form insulating structures while removing or reducing the discharge of undesirable by-products. CONSTITUTION: A composition comprises a boron-containing hydrogen silsesquioxane polymer having a structure that includes silicon-oxygen-silicon units and oxygen-boron-oxygen linkages in which the boron is a trivalent, wherein two silicon-oxygen-silicon units are covalently bound by an oxygen-boron-oxygen linkage therebetween. The boron is present in the boron-containing hydrogen silsesquioxane polymer in an amount of approximately 0.5 to 5 mol %.</p> |
申请公布号 |
KR20110011487(A) |
申请公布日期 |
2011.02.08 |
申请号 |
KR20090091323 |
申请日期 |
2009.09.25 |
申请人 |
CHEIL INDUSTRIES INC. |
发明人 |
LIM, SANG HAK |
分类号 |
C08L83/08;C08L83/04;H01L23/29 |
主分类号 |
C08L83/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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