| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for controlling an exposure apparatus, by which a recipe (parameter file) can be prepared without requiring an operator to approach an exposure apparatus in a clean room, and thereby, the prepared recipe can be efficiently and easily used without errors. <P>SOLUTION: The apparatus information 110 of an exposure apparatus is preliminarily stored in a computer 100, which is placed away from the exposure apparatus 1. The information 130 of a mask and of a substrate to be used is input to the computer, and a recipe 120 for carrying out an exposure operation is prepared by the computer by referring the apparatus information. The recipe is stored in a memory 6 inside a controller 5 of the exposure apparatus through a portable storage medium 200 or through a data transfer path. <P>COPYRIGHT: (C)2011,JPO&INPIT |
