发明名称 CONTACT LAYOUT STRUCTURE
摘要 A contact layout structure includes a substrate having at least a first region defined thereon, plural sets of first contact layouts positioned along a predetermined direction in the first region, and a plurality of second contact layouts positioned in the first region. Each set of the first contact layouts further comprises two square contact units and two adjacent rectangle contact units positioned in between the two square contact units. Each of the rectangle contact units comprises two opposite long sides and two opposite short sides, and a length of the long sides is not equal to the a length of the short sides.
申请公布号 US2011024921(A1) 申请公布日期 2011.02.03
申请号 US20100896923 申请日期 2010.10.04
申请人 WANG WEN-CHIEH 发明人 WANG WEN-CHIEH
分类号 H01L23/48 主分类号 H01L23/48
代理机构 代理人
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